发明名称 ALIGNMENT APPARATUS FOR VACUUM DEPOSITION
摘要 PROBLEM TO BE SOLVED: To provide an alignment apparatus for vacuum deposition where the improvement of working efficiency can be attained. SOLUTION: Regarding the apparatus, the alignment between a mask body 4 held by a mask holding body 5 and a glass substrate 6 held by a substrate holding body 7 is performed in a vacuum vessel 2 for alignment different from the one for vapor deposition, further, the carrying-in/out thereof to each vacuum vessel is performed by a carrying means 17 in a state where the substrate 6 is mounted on the mask body 4 and a pressing plate 9 is mounted on the substrate. The holding frame 71 of the mask holding body is provided with a pressing plate supporting bar 72 capable of elevating only the pressing plate when the mask body supported by the carrying means is held by the mask holding body, and further, the holding frame 74 of the substrate holding body is provided with a substrate supporting rod 75 of elevating only the substrate when the substrate holding body is elevated by an elevation means 16 in a state where the substrate is mounted on the mask body. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007119794(A) 申请公布日期 2007.05.17
申请号 JP20050309168 申请日期 2005.10.25
申请人 HITACHI ZOSEN CORP 发明人 OKADA TOSHIYUKI;KIKUCHI MASAHIRO
分类号 C23C14/04;C23C14/24 主分类号 C23C14/04
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