发明名称 COMPOUND AND METHOD FOR PRODUCING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a compound which can be used for resist compositions, and to provide a method for producing the compound. <P>SOLUTION: The compound represented by the general formula (I) [R is an acid-dissociable dissolution-inhibiting group; R<SP>11</SP>to R<SP>17</SP>are each an alkyl group or the like; (g)+(j)+(k)+(q)&le;5; (b)+(l)+(m)&le;4; (c)+(n)+(o)&le;4; A is a group represented by formula (Ia) or (Ib) or an alicyclic group]. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007119370(A) 申请公布日期 2007.05.17
申请号 JP20050310979 申请日期 2005.10.26
申请人 TOKYO OHKA KOGYO CO LTD 发明人 HIROSAKI TAKAKO;SHIONO HIROHISA;HIRAYAMA HIROSHI;HANEDA HIDEO
分类号 C07C69/736;C07C67/31;G03F7/039;H01L21/027 主分类号 C07C69/736
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