发明名称 |
COMPOUND AND METHOD FOR PRODUCING THE SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a compound which can be used for resist compositions, and to provide a method for producing the compound. <P>SOLUTION: The compound represented by the general formula (I) [R is an acid-dissociable dissolution-inhibiting group; R<SP>11</SP>to R<SP>17</SP>are each an alkyl group or the like; (g)+(j)+(k)+(q)≤5; (b)+(l)+(m)≤4; (c)+(n)+(o)≤4; A is a group represented by formula (Ia) or (Ib) or an alicyclic group]. <P>COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2007119370(A) |
申请公布日期 |
2007.05.17 |
申请号 |
JP20050310979 |
申请日期 |
2005.10.26 |
申请人 |
TOKYO OHKA KOGYO CO LTD |
发明人 |
HIROSAKI TAKAKO;SHIONO HIROHISA;HIRAYAMA HIROSHI;HANEDA HIDEO |
分类号 |
C07C69/736;C07C67/31;G03F7/039;H01L21/027 |
主分类号 |
C07C69/736 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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