发明名称 FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND PHOTOELECTRIC CONVERTER MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a reliable photoelectric converter capable of suppressing a curl of a substrate. <P>SOLUTION: A film deposition apparatus comprises a first conveyance chamber having a roller for delivering a substrate, a film deposition chamber having a discharge electrode, a buffer chamber installed between the conveyance chamber and the film deposition chamber, or between the film deposition chambers, a slit formed in a part through which the substrate in the buffer chamber is conveyed, and a second conveyance chamber having a roller for winding the substrate. At least one touch roll is installed in the slit, and the touch roller is brought into contact with a film deposition surface of the substrate. A film deposition method and a photoelectric converter manufacturing method are performed by using the film deposition apparatus. By using the film deposition method, damages of a photo-sensing area of an element can be prevented. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007119911(A) 申请公布日期 2007.05.17
申请号 JP20060257478 申请日期 2006.09.22
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 HIURA YOSHIKAZU;ADACHI HIROKI;TAKAHASHI HIRONOBU;SUGAWARA HIROSUKE;ARAO TATSUYA;NISHI KAZUO;ARAI YASUYUKI
分类号 C23C16/54;H01L31/04;H01L31/10 主分类号 C23C16/54
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