| 摘要 |
In order to fabricate a light reflective structure for a liquid crystal display, a photosensitive resin layer is formed with use of a thermosetting photosensitive resin, the photosensitive resin layer is exposed through a photomask having a particular pattern by a proximity method, the exposed photosensitive resin layer is developed to form an insolubilized resin layer, and the insolubilized resin layer is subjected to a heat treatment to have surface smoothness improved and to accelerate setting of the resin layer. |
