| 摘要 |
PROBLEM TO BE SOLVED: To provide a hologram exposure apparatus capable of forming holograms of multi-layouts with satisfactory accuracy on a base material for multi-layout holograms, and to provide a hologram exposure method. SOLUTION: The hologram exposure apparatus 20 is equipped with a base 21 and a frame 22 for holding the base material 10 for the multi-layout holograms provided on the base 21. The frame 22 is made movable in the vertical direction and the horizontal direction on the base 21, and is moved in the vertical direction by a vertical direction moving mechanism 28 and is moved in the horizontal direction by a horizontal direction moving mechanism 30. Object light is made incident in the horizontal direction from one side face, and reference light is made incident in the horizontal direction from the other side face, with respect to the base material 10 for the multi-layout holograms held at the frame 22, and thereby the element holograms 10a are formed on the base material 10 for the multi-layout holograms. COPYRIGHT: (C)2007,JPO&INPIT
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