发明名称 PROCESSING METHOD OF SUBSTRATE AND MANUFACTURING METHOD OF LIQUID JETTING HEAD
摘要 PROBLEM TO BE SOLVED: To provide a processing method of a substrate which prevents foreign substances from being generated, and to provide a manufacturing method of a liquid jetting head. SOLUTION: A metal layer 124 is formed over the whole faces of the substrate 130 where a through-hole 35 penetrating in the thickness direction is formed. Thereafter, while a protecting sheet 200 where an exposure hole 201 communicating with the through-hole 35 is formed in a region opposed to the through-hole 35, is attached to one face of the substrate 130, the metal layer 124 of the other face of the substrate 130 and in the through-hole 35 is removed by wet etching. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007118192(A) 申请公布日期 2007.05.17
申请号 JP20050309087 申请日期 2005.10.24
申请人 SEIKO EPSON CORP 发明人 YASOJIMA TAKESHI;ONODERA TOSHIYA
分类号 B41J2/16 主分类号 B41J2/16
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