Method and device for doping, diffusion and oxidation of silicon wafers under reduced pressure,申请号HK20040110394-传众专利搜索

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发明名称	Method and device for doping, diffusion and oxidation of silicon wafers under reduced pressure
摘要
申请公布号	HK1067786(A1)	申请公布日期	2007.05.04
申请号	HK20040110394	申请日期	2004.12.31
申请人	SEMCO ENGINEERING SA	发明人	PELLEGRIN YVON
分类号	H01L;H01L21/22;C30B;C30B31/00;C30B33/00;H01L21/00;H01L21/31	主分类号	H01L
代理机构		代理人
主权项
地址

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