| 摘要 |
A transfer apparatus installed in a transfer chamber of substrate processing equipment can be precisely calibrated with respect to a substrate support of a process chamber. Also, the calibration can be performed while a vacuum pressure is maintained in the transfer chamber. The tool for calibrating the transfer apparatus includes a base plate and a light source mounted to the base plate. The base plate is mounted to the process chamber, and the light source is positioned and oriented to direct a beam of light onto a reference mark on the substrate support. Then, an end effecter of the transfer apparatus is moved to a transfer position over the substrate support. The end effecter has a reference hole that is aligned with the reference mark when the end effecter is in a centered state relative to the substrate support. The beam of light is used to determine whether the reference hole is aligned with the reference mark. |
