| 摘要 |
The etching, rinsing and drying of substrates (1), in the same tank (3) made up of a lower part and a liquid inlet-outlet system (4), comprises: etching by total immersion of the substrates in an etching liquid (5); at least one rinsing in a rinsing liquid introduced by the inlet-outlet system; and drying by the passage of the substrates across a drying liquid arranged above the rinsing liquid. An apolar protective liquid (6) immiscible in water, non-reactive to the substrates and having density lower than those of the engraving and rinsing liquids, is introduced into the tank, before the etching stage, and is maintained in the tank, at least until the drying stage, such that, before the drying stage, the substrates stay permanently, totally immersed in at least one of the etching, protective and rinsing liquids.
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