NOZZLE CLEANING APPARATUS AND SUBSTRATE PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To improve washing effect in washing treatment of a discharge nozzle for discharging a prescribed treating liquid with respect to washing technique for the discharge nozzle.

SOLUTION: A guide block 743 for approaching below a discharge port 41a of a slit nozzle 41 is provided at a washing section 74 for washing a slit nozzle 41. Gas nozzles 710 for blowing gaseous nitrogen and washing nozzles 750 for ejecting rinse liquid LQ are provided and further a suction mechanism sucks the lower part of the discharge port 41a of the slit nozzle 41. Thickness of the guide block 743 in a X-axis direction is made to be larger than the width of the discharge port 41a in the X-axis direction, and thereby adjustment is performed so that suction force by the suction mechanism may not directly act on the discharge port 41a. Thereby suction force of the suction mechanism can be raised and washing effect is improved.

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