| 摘要 |
A heat treatment device for baking a chemically amplified resist film formed on a substrate after exposure but before development includes a table that supports the substrate, a heater that heats the substrate, a magnetic field generating unit that generates a magnetic field of lines of magnetic flux directed in a film thickness direction of the resist film and reverses the direction of the lines of magnetic flux, and a controller unit that controls the magnetic field generating unit to generate the magnetic field acting on the resist film at least while the substrate is being heated by the heater unit.
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