| 摘要 |
The invention relates to an intervertebral implant comprising a spacer designed to be applied between two spinous processes of two vertebrae. The spacer comprises: two elements ( 10, 12 ) made of a first material, and each presenting a first end ( 10 a, 12 a) and a second end ( 10 b, 12 b), said first end ( 10 a, 12 a) being securable to a spinous process; and a connection piece ( 14 ) made of a second material of greater elastic deformability than said first material, said connection piece interconnecting said second ends ( 10 b, 12 b) of said two elements ( 10, 12 ) so that the stresses that are exerted on said two elements ( 10, 12 ) are damped, and said connection piece enabling said intervertebral implant to limit and brake the relative movements of said vertebrae. |
