| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a projection optical system which can obtain pattern images of a desired line width over an effective image formation area without being substantially affected by scattered lights caused by the surface roughness, etc. of a refraction face or reflection face, for example. <P>SOLUTION: The projection optical system which forms images of a first face (M) on a second face (W) comprises a diffusion face which is disposed at a given location in an optical path between the first face and the second face, and has a required diffusing power distribution for setting a distribution of flare lights reaching the effective image formation area on the second face to a given distribution. The diffusion face is formed on the reflection face of a planar reflection mirror (M0) disposed at a given location substantially apart from a pupil location of the projection optical system. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
