| 摘要 |
<P>PROBLEM TO BE SOLVED: To perform position alignment of a mask and a work piece by detecting two alignment marks located outside the depth of focus range without moving an alignment microscope in an optical axis direction. <P>SOLUTION: When the alignment mark of a mask M is detected, a work stage 3 moves to the right side of the drawing, a parallel plate 5 attached to the side face of the work stage 3 is inserted into the optical path of an alignment microscope 4 and the location of the alignment mark of the mask M is detected and memorized. When the alignment mark of a work piece W is detected, the work stage 3 shifts to the location of the drawing. The alignment microscope 4 is inserted into the inside of the work stage 3 so that the work-piece mark WAM may be detected by the alignment microscope 4 via the through tube 3b. When the two alignment marks are detected, the work stage 3 is shifted so that they should become a predetermined positional relationship, and thus, exposing light is irradiated from the light emitter 1 so as to expose the mask pattern to the work piece W. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
