发明名称 HIGHER ORDER ABERRATION MEASUREMENT APPARATUS FOR EYES
摘要 <P>PROBLEM TO BE SOLVED: To evaluate the effect of reducing aberration visibly and quantitatively and display which aberration is dominant in an easy-to-understand manner. <P>SOLUTION: A measuring member for wavefront aberration measures wavefront aberration including higher order aberration of the eyes to be examined from the photodetective signal of the photodetective part of the wavefront aberration measuring system. A display member has a selection mode to select higher-order aberration to be displayed from the wavefront aberration measured by the wavefront aberration measuring member. A simulation member calculates the degree of affection of the measured wavefront aberration element on eyes. The display member displays wavefront aberrations measured by the wavefront aberration measuring member for each higher-order aberration including arrow aberration, coma aberration, spherical aberration, astigmatism and tetra-foil respectively, and the affection of the higher-order aberration element calculated by the simulation member. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006116112(A) 申请公布日期 2006.05.11
申请号 JP20040307884 申请日期 2004.10.22
申请人 TOPCON CORP;OSAKA UNIV 发明人 HIROHARA YOKO;NAKAO HIROHISA;MAEDA NAOYUKI
分类号 A61B3/10 主分类号 A61B3/10
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