| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for evaluating a case for housing a semiconductor wafer capable of confirming change over time about occurrence of impurities in the housing case in a short time. SOLUTION: Changes over time about occurrence of wafer contaminants is evaluated in a semiconductor wafer housing case 1 of synthetic resin. A semiconductor wafer, the impurity on the surface of which is measured, is housed and sealed in the semiconductor wafer housing case. Then the semiconductor wafer housing case is preserved under a prescribed standard environment like preservation in a clean room, and it is applied with moisture absorbing/releasing process to apply or remove moisture. After the moisture absorbing/releasing process, the impurity on the surface of semiconductor wafer is measured again, which is compared with a measurement result before sealing. COPYRIGHT: (C)2006,JPO&NCIPI |
