TRANSPARENT CONDUCTIVE FILM DEPOSITING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a transparent conductive film depositing method capable of depositing a transparent conductive film of low resistivity on an organic film at a low temperature. SOLUTION: In the method for depositing a transparent conductive film on an organic film by a DC magnetron sputtering method using an In-Sn-O based target, the sputtering is performed with the bias voltage of -70 to -130V, and the target current of 0.1-0.7A. COPYRIGHT: (C)2006,JPO&NCIPI