发明名称 |
System and method for aligning wafers within wafer processing equipment |
摘要 |
Systems and methods for aligning wafers within wafer processing equipment. In a first embodiment, a wafer alignment nozzle comprises a fixed cylindrical member. A moveable cylindrical member is disposed with the fixed cylindrical member in a sliding fit. The moveable cylindrical member comprises a plurality of angled fluid orifices for directing a plurality of streams of the fluid onto a surface of the wafer.
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申请公布号 |
US2006096612(A1) |
申请公布日期 |
2006.05.11 |
申请号 |
US20040982029 |
申请日期 |
2004.11.05 |
申请人 |
FENG JIAN-HUEI;GUTHRIE HUNG-CHIN;LE QUANG;NYSTROM JAMES |
发明人 |
FENG JIAN-HUEI;GUTHRIE HUNG-CHIN;LE QUANG;NYSTROM JAMES |
分类号 |
C23G1/00;B08B3/00 |
主分类号 |
C23G1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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