发明名称 System and method for aligning wafers within wafer processing equipment
摘要 Systems and methods for aligning wafers within wafer processing equipment. In a first embodiment, a wafer alignment nozzle comprises a fixed cylindrical member. A moveable cylindrical member is disposed with the fixed cylindrical member in a sliding fit. The moveable cylindrical member comprises a plurality of angled fluid orifices for directing a plurality of streams of the fluid onto a surface of the wafer.
申请公布号 US2006096612(A1) 申请公布日期 2006.05.11
申请号 US20040982029 申请日期 2004.11.05
申请人 FENG JIAN-HUEI;GUTHRIE HUNG-CHIN;LE QUANG;NYSTROM JAMES 发明人 FENG JIAN-HUEI;GUTHRIE HUNG-CHIN;LE QUANG;NYSTROM JAMES
分类号 C23G1/00;B08B3/00 主分类号 C23G1/00
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