发明名称 |
Exposure system, test mask for monitoring polarization, and method for monitoring polarization |
摘要 |
An exposure system includes an exposure tool configured to project grating patterns oriented in different directions onto test areas by a linearly polarized light, respectively, each of the grating patterns having a space width preventing higher order diffracted lights from an image formation, a data collector configured to collect sets of test optical intensity data on the test areas, and a polarization direction monitor configured to monitor a polarization direction of the linearly polarized light by comparing the sets of the test optical intensity data.
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申请公布号 |
US2006098183(A1) |
申请公布日期 |
2006.05.11 |
申请号 |
US20050267103 |
申请日期 |
2005.11.07 |
申请人 |
SATO TAKASHI;FUKUHARA KAZUYA;ASANUMA KEITA |
发明人 |
SATO TAKASHI;FUKUHARA KAZUYA;ASANUMA KEITA |
分类号 |
G03B27/72;G03F1/00;G03F1/70;G03F7/20;H01L21/027 |
主分类号 |
G03B27/72 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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