HIGH-POWER DIELECTRIC SEASONING FOR STABLE WAFER-TO-WAFER THICKNESS UNIFORMITY OF DIELECTRIC CVD FILMS

摘要

A method for seasoning a deposition chamber wherein the chamber components and walls are densely coated with a material that does not contain carbon prior to deposition of an organo-silicon material on a substrate. An optional carbon-containing layer may be deposited therebetween. A chamber cleaning method using low energy plasma and low pressure to remove residue from internal chamber surfaces is provided and may be combined with the seasoning process.