发明名称 Method of resetting substrate processing apparatus, storage medium storing program for implementing the method, and substrate processing apparatus
摘要 A method of resetting a substrate processing apparatus having a chamber which is capable of carrying out abnormality judgment on the substrate processing apparatus accurately without causing a decrease in the utilization ratio of the substrate processing apparatus. The chamber is evacuated. A temperature in the chamber is set. Whether or not there is an abnormality in the chamber is judged. An atmosphere in the chamber is stabilized so as to conform to predetermined processing conditions. At least one selected from data that change in response to a change in a state inside the chamber is measured. The measured data is compared with reference data that corresponds to the measured data for a normal state in the chamber.
申请公布号 US2006100825(A1) 申请公布日期 2006.05.11
申请号 US20050270775 申请日期 2005.11.10
申请人 TOKYO ELECTRON LIMITED 发明人 FURUYA HAJIME;TANAKA HIDEKI;OKUBO TOMOYA;KOBAYASHI RYOKO
分类号 G06F11/30 主分类号 G06F11/30
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