Electrostatic chuck including a heater mechanism

摘要

An electrostatic chuck comprises a main body with a mounting surface and an opposed surface facing away from the mounting surface. At least one chucking electrode extends along the mounting surface of the main body and a first heater layer extends along the opposed surface of the main body. The electrostatic chuck can be used to heat and electrostatic ally attract a work piece, such as a wafer, to a work piece support surface during various processing techniques.