ANTISTATIC AGENT, AND ANTISTATIC FILM, COATED PRODUCT AND PATTERN FORMING METHOD USING THE AGENT

摘要

PROBLEM TO BE SOLVED: To provide an antistatic agent which is excellent to prevent a chemical amplification resist from wearing in the film, and an antistatic film, a coated product and a pattern forming method using the antistatic agent.

SOLUTION: The antistatic agent comprises a water base solvent-soluble electroconductive polymer, a bivalent or more aliphatic basic compound, and an anionic surfactant, wherein the water-soluble electroconductive polymer is preferably a π conjugated electroconductive polymer and the bivalent or more aliphatic basic compound has preferably a content of 0.1-75 mol% relative to the total moles of a basic compound contained. The antistatic film, the coated product and the pattern forming method use the antistatic agent.

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