发明名称 METHOD AND APPARATUS FOR TREATING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To significantly improve cleaning power and a film removing capability by enhancing the activity of a cleaning liquid and a treating liquid. SOLUTION: A cleaning liquid S supplied to a substrate W is irradiated with ultraviolet rays from a UV irradiation part 31. In this case, the cleaning liquid S containing ozone is brought to an excited state, by the ultraviolet rays irradiation, as represented by "O<SB>3</SB>→O(<SP>3</SP>p)+O<SB>2</SB>", whereby oxygen radicals can be provided by low energy. Thus, oxygen radicals can easily be generated, the activity of the cleaning liquid S can be enhanced, and the cleaning power can be significantly improved. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006116542(A) 申请公布日期 2006.05.11
申请号 JP20050309790 申请日期 2005.10.25
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 HIRAE SADAO;SATO MASANOBU;YASUDA SHUICHI
分类号 B08B3/02;B08B3/08;B08B3/10;G02F1/13;G02F1/1333;G03F7/42;H01L21/304 主分类号 B08B3/02
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