发明名称 |
Projection exposure system and method of manufacturing a miniaturized device |
摘要 |
A projection exposure system and method of manufacturing a miniaturized device using the projecting exposure system uses an imaging of a patterning structure onto a substrate using a projection optical system. Measuring light is directed through the projection optical system to be incident on the substrate and measuring light reflected from the substrate is superimposed with reference light to generate an interference pattern. The interference pattern is analyzed to determine imaging properties of the projecting optical system. Actuators of the projection optical system may be used to improve the imaging characteristics.
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申请公布号 |
US2006098210(A1) |
申请公布日期 |
2006.05.11 |
申请号 |
US20050248279 |
申请日期 |
2005.10.13 |
申请人 |
CARL ZEISS SMT AG |
发明人 |
FREIMANN ROLF;WAGEMANN ULRICH |
分类号 |
G01B9/02 |
主分类号 |
G01B9/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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