| 摘要 |
A method and a system for optical measuring in a structure having a pattern in the form of spaced-apart parallel elongated regions of optical properties different from that of spaces between said regions. The system comprises a broadband illuminator ( 8 ) for generating incident radiation, a spectrophotometer arrangement ( 30 ) for detecting a spectral response of the structure to the incident radiation, and an optical arrangement ( 2 ) for directing the incident light to the structure and collecting the response of the structure, said optical arrangement ( 2 ) comprising a numerical aperture ( 32 ) selectively limiting the range of at least one of light incidence or collecting angles in direction substantially perpendicular to longitudinal axes of said elongated regions of the pattern.
|
