AZEOTROPIC MIXTURE OF FLUOROMETHANE AND HYDROGEN CHLORIDE AND PROCESS FOR PURIFYING FLUOROMETHANE

摘要

It is an object of the present invention to provide a method capable of efficiently producing high-purity HFC-41 which can be used as an etching gas for semiconductors. The process for purifying fluoromethane of the present invention comprises distilling a mixture containing fluoromethane and hydrogen chloride to distill out fluoromethane from the top of distillatio column an obtain an azeotropic mixture of fluoromethane and hydrogen chloride form the bottom of the distillation column.