| 摘要 |
PROBLEM TO BE SOLVED: To provide a coating fluid for forming an amorphous silica film having a dielectric constant as small as≤3.0, and furthermore a small amount of leakage current and its preparation method. SOLUTION: The coating liquid for forming a low dielectric constant amorphous silica film is a liquid composition containing (a) a silicon compound obtained by hydrolyzing a tetraalkyl orthosilicate (TAOS) and an alkoxysilane (AS) in the presence of a tetraalkylammonium hydroxide (TAAOH) and water or obtained by hydrolyzing or partially hydrolyzing a tetraalkyl orthosilicate (TAOS) in the presence of a tetraalkylammonium hydroxide (TAAOH) and water, then mixing the resulting hydrolyzate with an alkoxysilane (AS), its hydrolyzate or its partial hydrolyzate and, if necessary, further hydrolyzing part or all of them, (b) an organic solvent, and (c) water and furthermore, the amount of water present in the liquid composition is in the range of 30-60 wt.%. COPYRIGHT: (C)2006,JPO&NCIPI
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