NOVEL RESIST MATERIAL AND METHOD FOR FORMING A PATTERNED RESIST LAYER ON A SUBSTRATE

摘要

The present invention resides in a method for the formation of a patterned resist layer on a substrate surface by patternwise irradiation with actinic radiation. The first step of the method is formation of a coating layer comprising a substituted triphenylene compound having a diameter of between 1 and 3 nm, a sensitizer which increases the sensitivity of the exposed layer to the actinic radiation used in a subsequent irradiation step and a cross-linker on the substrate surface. Subsequently the coating layer is irradiated patternwise, and unirradiated areas of the coating layer are removed. The invention also resides in a resist material comprising a solution of: - (i) as the principal resist material a triphenylene derivative having a diameter of from 1 to 3 rim, (ii) a sensitizer which increases the sensitivity of the resist material to actinic radiation, and (iii) a cross linker capable of cross linking molecules of the triphenylene derivative, said cross linker optionally being constituted by a moiety attached to said triphenylene derivative.