发明名称 METHOD FOR ORGANIC MONOMOLECULAR LAYER FORMATION AND PROCESS FOR PRODUCING FUNCTIONAL ELEMENT
摘要 <p>A hydrogen terminating n-type semiconductor substrate, which comprises at least one element selected from the group consisting of Si, Ge, and C and has a diamond structure, is used as a working electrode. While selectively applying light having a higher photon energy than the energy gap of the hydrogen terminating n-type semiconductor substrate to the surface of the hydrogen terminating n-type semiconductor substrate, an electrode reaction is allowed to proceed in a solution containing a Grignard reagent to form a predetermined pattern of an organic monomolecular layer on the surface of the hydrogen terminating n-type semiconductor substrate.</p>
申请公布号 WO2006049189(A1) 申请公布日期 2006.05.11
申请号 WO2005JP20153 申请日期 2005.10.27
申请人 NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY;UOSAKI, KOHEI;TAKAKUSAGI, SATORU 发明人 UOSAKI, KOHEI;TAKAKUSAGI, SATORU
分类号 B82B3/00;B05D7/24;H01L21/368;H01L51/05 主分类号 B82B3/00
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