发明名称 |
METHOD FOR ORGANIC MONOMOLECULAR LAYER FORMATION AND PROCESS FOR PRODUCING FUNCTIONAL ELEMENT |
摘要 |
<p>A hydrogen terminating n-type semiconductor substrate, which comprises at least one element selected from the group consisting of Si, Ge, and C and has a diamond structure, is used as a working electrode. While selectively applying light having a higher photon energy than the energy gap of the hydrogen terminating n-type semiconductor substrate to the surface of the hydrogen terminating n-type semiconductor substrate, an electrode reaction is allowed to proceed in a solution containing a Grignard reagent to form a predetermined pattern of an organic monomolecular layer on the surface of the hydrogen terminating n-type semiconductor substrate.</p> |
申请公布号 |
WO2006049189(A1) |
申请公布日期 |
2006.05.11 |
申请号 |
WO2005JP20153 |
申请日期 |
2005.10.27 |
申请人 |
NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY;UOSAKI, KOHEI;TAKAKUSAGI, SATORU |
发明人 |
UOSAKI, KOHEI;TAKAKUSAGI, SATORU |
分类号 |
B82B3/00;B05D7/24;H01L21/368;H01L51/05 |
主分类号 |
B82B3/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|