发明名称 POLISHING METHOD AND POLISHING UNIT
摘要 <P>PROBLEM TO BE SOLVED: To provide a polishing method, favorable in respect of cost even in the case of small-lot multi-product production and forming a regular machining surface without limitation on the shape and material quality of a material to be polished in the case of non-magnetic substance, and to provide a polishing unit obtained by the method. <P>SOLUTION: This polishing method uses a magnetic polishing fluid 1 containing magnetic particles, polishing particles and a medium. According to the polishing method, a magnetic polishing fluid 1 is disposed on one face of the material 2 to be polished as a polishing object, a magnetic pole 3 is disposed outward on the other face, a magnetic field is generated in the magnetic pole to improve the viscosity of the magnetic polishing fluid 1, and the material to be polished is moved. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006116652(A) 申请公布日期 2006.05.11
申请号 JP20040306815 申请日期 2004.10.21
申请人 BANDO CHEM IND LTD 发明人 TONOMURA TAKUYA;GREENSLET HITOMI
分类号 B24B37/00;C09K3/14 主分类号 B24B37/00
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