发明名称 |
Etchants containing filterable surfactant |
摘要 |
An improved etching and cleaning composition for semiconductor devices is provided in which the etch solution incorporates a novel surfactant comprising a combination of a linear perfluorocarboxylic acid, a cyclic amine and an aliphatic alcohol.
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申请公布号 |
US2006097218(A1) |
申请公布日期 |
2006.05.11 |
申请号 |
US20040984649 |
申请日期 |
2004.11.09 |
申请人 |
GENERAL CHEMICAL PERFORMANCE PRODUCTS LLC |
发明人 |
MORI ERIK;HONG BRIAN;CRAIG JAMES |
分类号 |
C09K13/00;C09K13/04 |
主分类号 |
C09K13/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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