发明名称 Processing device and processing method
摘要 A chamber having an approximately triangular transverse cross section is provided with a gas supply opening at its one side, and is provided with an exhaust opening at a vertex facing the one side. Further, the gas supply opening is provided with a showerhead-like gas supply section. Based on this configuration, the chamber is structured such that a cross-sectional area of a gas flow passage formed from the gas supply opening to the exhaust opening gradually decreases toward a direction of gas supply. At this time, a thickness of a boundary layer formed on a wall of the chamber becomes substantially constant.
申请公布号 US2006096531(A1) 申请公布日期 2006.05.11
申请号 US20050516311 申请日期 2005.08.12
申请人 TOKYO ELECTRON LIMITED 发明人 ISHIZAKA TADAHIRO;GUNJI ISAO;KANNAN HIROSHI;SAWADA IKUO;KOJIMA YASUHIKO
分类号 C23C16/00;C23C16/455 主分类号 C23C16/00
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