发明名称 COATING LIQUID FOR FORMING SILICA BASED FILM
摘要 PROBLEM TO BE SOLVED: To provide a coating liquid for forming a silica based film which has a low dielectric constant and can form a silica based film which is hard to reduce film thickness by peeling liquid or to raise a dielectric constant. SOLUTION: The coating liquid for forming the silica based film contains (A) a reaction product made to perform a hydrolysis reaction of the alkyltrialkoxysilane, and (B) one type or more selected from a group consisting of a polyalkyleneglycol and its end alkylate. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006120919(A) 申请公布日期 2006.05.11
申请号 JP20040308221 申请日期 2004.10.22
申请人 TOKYO OHKA KOGYO CO LTD 发明人 IIDA HIROYUKI;SATO ISAO;TAKAHAMA AKIRA
分类号 H01L21/316;C08K5/19;C08L71/02;C08L83/04;C09D1/00;C09D171/02;C09D183/04;H01L21/312 主分类号 H01L21/316
代理机构 代理人
主权项
地址