发明名称 RESIN COMPOSITION FOR FORMING PATTERN AND PATTERN FORMING PROCESS
摘要 PROBLEM TO BE SOLVED: To provide a resin composition for forming a pattern which gives an optical waveguide excellent in precision and shape as well as heat resistance and light transmissivity, and also to provide a pattern forming process, which is simple and inexpensive and gives an excellent micro pattern with an excellent pattern precision and a pattern shape. SOLUTION: The resin composition for forming a pattern contains a silicone polymer having a carbon-carbon unsaturated bond and a silicon-hydrogen bond in a molecule. The pattern forming process comprises the steps of creating a coated surface prepared by coating the above composition on a substrate and stamping molding by pressing a stamper-mask prepared with a specific shape on the coated substrate. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006117846(A) 申请公布日期 2006.05.11
申请号 JP20040308693 申请日期 2004.10.22
申请人 HITACHI CHEM CO LTD 发明人 HASHIMOTO MICHIAKI
分类号 C09D183/05;B05D7/24;C09D183/04;C09D183/07 主分类号 C09D183/05
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