发明名称 |
Pattern formation method and pattern formation apparatus, method for manufacturing device, electro-optical device, electronic device, and method for manufacturing active matrix substrate |
摘要 |
A pattern formation method for forming a film pattern upon a substrate, including the steps of: forming banks in a predetermined pattern upon the substrate; disposing liquid drops of a functional liquid at the end portions of groove portions which are defined between the banks; and after having disposed the drops at the end portions of the groove portions, disposing liquid drops in positions of the groove portions other than the end portions thereof.
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申请公布号 |
US2006099759(A1) |
申请公布日期 |
2006.05.11 |
申请号 |
US20050302147 |
申请日期 |
2005.12.14 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
HASEI HIRONORI |
分类号 |
G02F1/1343;H01L21/8238;B05D1/26;G02F1/1345;G02F1/1368;G09F9/00;H01L21/28;H01L21/288;H01L21/3205;H01L21/336;H01L29/786;H01L51/40;H01L51/50;H01L51/56;H05B33/10;H05B33/12;H05K3/12 |
主分类号 |
G02F1/1343 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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