发明名称 Pattern formation method and pattern formation apparatus, method for manufacturing device, electro-optical device, electronic device, and method for manufacturing active matrix substrate
摘要 A pattern formation method for forming a film pattern upon a substrate, including the steps of: forming banks in a predetermined pattern upon the substrate; disposing liquid drops of a functional liquid at the end portions of groove portions which are defined between the banks; and after having disposed the drops at the end portions of the groove portions, disposing liquid drops in positions of the groove portions other than the end portions thereof.
申请公布号 US2006099759(A1) 申请公布日期 2006.05.11
申请号 US20050302147 申请日期 2005.12.14
申请人 SEIKO EPSON CORPORATION 发明人 HASEI HIRONORI
分类号 G02F1/1343;H01L21/8238;B05D1/26;G02F1/1345;G02F1/1368;G09F9/00;H01L21/28;H01L21/288;H01L21/3205;H01L21/336;H01L29/786;H01L51/40;H01L51/50;H01L51/56;H05B33/10;H05B33/12;H05K3/12 主分类号 G02F1/1343
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