| 摘要 |
A half tone mask having a transparent substrate, a light semitransmission layer, and a light shield layer, a method for fabricating the same, and a flat panel display using the same. The half tone mask is applied to multiple cycles of a photolithography process, thus shortening a time taken to fabricate the mask and reducing the production costs of the mask. Since a desired pattern is uniformly formed through a light semitransmission layer of the half tone mask of the present invention according to the uniformity of a chrome oxide (Cr<SUB>x</SUB>O<SUB>y</SUB>) film, i.e., the uniformity in sputtering, the half tone mask is not limited in size.
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