| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of measuring optical characteristic capable of measuring the optical characteristic related to pitch-dependence of the line width of a projected image within a substantially wide pitch range near a required pitch without the need for increasing kinds of a measurement pattern. <P>SOLUTION: An image is formed by an optical system to be analyzed of a measurement pattern 43A comprising a linear line pattern 41 extended in an X direction, and two line patterns 42A, 42B symmetrically tilted with respect to the line pattern 41 at a tilt angle θ. The line width of the image of the line pattern 41 is measured at a plurality of positions in the lengthwise direction of the image of the central line pattern 41 and the optical characteristic of the optical system to be analyzed is obtained on the basis of a result of the measurement. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
