发明名称 EXPOSURE DEVICE AND EXPOSURE METHOD
摘要 <P>PROBLEM TO BE SOLVED: To attain long lifetime for an UV-ray exposure device, by enhancing the efficiency of removing impurities contained in gas being supplied to the UV-ray exposure device and preventing deposition of impurities in the UV-ray irradiated region or on the periphery thereof, thereby preventing deterioration in the image formation performance of the exposure device. <P>SOLUTION: An adsorption material, having a fibrous structure is arranged, such that a space is provided between the fibrous structure and a metal tube that supports the optical system of the exposure device. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006120775(A) 申请公布日期 2006.05.11
申请号 JP20040305603 申请日期 2004.10.20
申请人 CANON INC 发明人 IIMURA AKIKO
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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