SUBSTRATE TREATMENT DEVICE, METHOD FOR MONITORING GENERATION OF ARCING IN SUBSTRATE TREATMENT DEVICE, METHOD FOR DEPOSITING TUNGSTEN THIN FILM AND TUNGSTEN THIN FILM DEPOSITING DEVICE

摘要

PROBLEM TO BE SOLVED: To effectively prevent arcing as abnormal discharge generated in the case a member made arranged so as to be close to the periphery of a substrate such as a shadow ring is present. SOLUTION: In a process chamber 1, the deposition of a tungsten film 92 by sputtering is performed to a substrate 9 held to a substrate holder 3. The substrate 9 is electrostatically attracted on a dielectric plate 31 by voltage applied to an attracting electrode 32 by an attraction power source 33, and the deposition of a thin film from the periphery of the substrate 9 to a region in a prescribed distance is prevented by a shadow shield 62. An electrically conductive film 71 covering a part of the surface in the dielectric plate 31 is contacted with the rear face of the substrate 9 and is insulated from an earth, and is further short-circuited to the shadow shield 62 by wiring 76 for a short-circuiting. The electric potential of the electrically conductive film 71 is measured by a voltmeter 72, and the generation of arcing is judged by a judging means 74 from the rapid variation of the measured value in the voltmeter 72. COPYRIGHT: (C)2006,JPO&NCIPI