| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam apparatus capable of lessening blooming of secondary electron due to a space charge effect of primary electron and lessening axial chromatic aberration or other aberration, as well as a manufacturing method of a device using the apparatus. SOLUTION: The apparatus for making a distance between a sample and the main face of an objective lens larger than a Bohr radius of the objective lens by constituting the objective lens with a magnetic lens and having its magnetic gap at a light axis side, as well as the manufacturing method of a semiconductor device using the apparatus are provided. COPYRIGHT: (C)2006,JPO&NCIPI
|
