发明名称 Reflective-type projection optical system and exposure apparatus equipped with said reflective-type projection optical system
摘要 A reflective-type projection optical system equipped with 8 reflective mirrors that forms a reduced image of a first surface on a second surface. It is equipped with a first reflective imaging optical system (G 1 ) for forming an intermediate image of the first surface and a second reflective imaging optical system (G 2 ) for forming an image of the intermediate image on the second surface. The first reflective imaging optical system has, from the first surface side in order of light beam incidence, a first reflective mirror (M 1 ), a second reflective mirror (M 2 ), a third reflective mirror (M 3 ), and a fourth reflective mirror (M 4 ). The second reflective imaging optical system has, from the first surface side in order of light beam incidence, a fifth reflective mirror (M 5 ), a sixth reflective mirror (M 6 ), a seventh reflective mirror (M 7 ), and an eighth reflective mirror (M 8 ). At least one of the reflective surfaces of these 8 reflective mirrors is composed of a spherical surface.
申请公布号 US2006098273(A1) 申请公布日期 2006.05.11
申请号 US20050266201 申请日期 2005.11.04
申请人 TAKAHASHI TOMOWAKI 发明人 TAKAHASHI TOMOWAKI
分类号 G02B17/00 主分类号 G02B17/00
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