发明名称 NOVOLAK PLANARISIERUNGSSCHICHT MIT HOHER WÄRMEBESTÄNDIGKEIT
摘要 <p>A process for forming a planarization film on a substrate that does not smoke or fume on heating includes applying a polymeric solution including a novolac resin having a weight average molecular weight between about 1000 and 3000 amu, which has been fractionated to remove molecules with molecular weight below about 350 amu, a surfactant selected from a group consisting of a non-fluorinated hydrocarbon, a fluorinated hydrocarbon and combinations thereof, and an optional organic solvent to a substrate, followed by heating the substrate.</p>
申请公布号 DE69930418(D1) 申请公布日期 2006.05.11
申请号 DE1999630418 申请日期 1999.12.20
申请人 HONEYWELL INTERNATIONAL INC., MORRISTOWN 发明人 SPEAR, RICHARD;KRAJEWSKI, TODD;HACKER, NIGEL
分类号 G03F7/09;G03F7/11;B29C41/24;C09D161/06;G03F7/023;H01L21/027 主分类号 G03F7/09
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