| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a liquid-immersed exposure device which can be kept stable in performance for a longer period than normally. <P>SOLUTION: The liquid-immersed exposure device is equipped with a projection optical system which projects a pattern provided on a reticle onto a substrate, and a liquid feeder which feeds liquid to, at least a part of space between the projection optical system and the substrate. Furthermore, the liquid-immersed exposure device is configured so as to be equipped with a unit which introduces a reducing agent into the liquid. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
