| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an exhaust gas treatment system capable of sufficiently treating an exhaust gas and enhanced in the rate of operation. <P>SOLUTION: The exhaust gas treatment system S is constituted so as to treat the exhaust gas such as the cleaning gas, the process gas or the like discharged from a semiconductor main process and equipped with a primary treatment unit 1 for removing a powder in the process gas and a secondary treatment unit 2 for heating and decomposing the exhaust gas from the primary treatment unit 1. The secondary treatment unit 2 includes a heating decomposition furnace 11 having a first treatment part 21 for heating and hydrolyzing the cleaning gas by electromagnetic induction heating and a second treatment part 23 for heating and decomposing the process gas by the remaining heat of electromagnetic induction heating. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
