发明名称 SEMICONDUCTOR LASER AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To prevent dopants from diffusing into an active layer when a p-type clad layer is increased in impurity concentration so as to provide a high power semiconductor laser of high reliability. SOLUTION: The semiconductor laser has a configuration wherein a double hetero-junction structure composed of an n-type GaAs buffer layer 201, an n-type AlGaInP clad layer 202, an undoped AlGaInP clad layer 203, an active layer 204, an undoped AlGaInP clad layer 205, a first p-type AlGaInP clad layer 206 (Mg-doped), a second undoped AlGaInP clad layer 207, a p-type GaInP etching stop layer 208, a third p-type AlGaInP clad layer 210 (Zn-doped), and a p-type GaInP contact layer 211 is formed on an n-type GaAs substrate 200. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006114660(A) 申请公布日期 2006.04.27
申请号 JP20040299897 申请日期 2004.10.14
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 UKAI TSUTOMU
分类号 H01S5/16;H01S5/223;H01S5/343 主分类号 H01S5/16
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