发明名称 EXPOSURE STATION FOR FILM WEBS
摘要 The invention relates to an exposure station (1) for producing partially formed regions in at least one layer of a film web (3), and optically variable elements which are produced by one such exposure station (1) and comprise partially formed regions with different optical properties. Said exposure station (1) comprises at least one radiation source (11) for exposing the film web (3), in addition to masking tape (2) which is provided with partially shaped regions with different optical properties and is guided in an exposure region (18) in the beam path between the at least one radiation source (11) and the film web (3). Said exposure station (1) comprises at least two guides (182, 183) for guiding the masking tape and/or the film web, said guides being arranged in such a way that the masking tape (2) is guided in the exposure region (18) parallel to the film web (3). The inventive exposure station (1) also comprises coupling means (181, 182, 183, 184) for moving the masking tape (2) and the film web (3) in the exposure region (18) at the same speed.
申请公布号 KR20060036079(A) 申请公布日期 2006.04.27
申请号 KR20067000087 申请日期 2004.07.01
申请人 LEONHARD KURZ GMBH & CO. KG 发明人 KATSCHOREK HAYMO;SEITZ MATHIAS
分类号 G03F7/20;B42D15/10;G03B27/08;G03B27/12;G03B27/18 主分类号 G03F7/20
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