发明名称 MANUFACTURING METHOD OF POLYCRYSTAL SILICON SOLAR CELL
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a manufacturing method of polycrystal silicon solar cell for efficiently conducting termination process of a polycrystal silicon substrate up to the inside of crystal within a short period of time and thereby for improving processing velocity and also remarkably improving substrate quality. <P>SOLUTION: The manufacturing method of polycrystal silicon solar cell mainly formed of polycrystal silicon substrate comprises the steps of forming an N layer and/or P layer within the polycrystal silicon substrate, forming an insulated layer and an electrode at the front surface of the polycrystal silicon substrate, and the high-pressure vapor terminating step of executing the heat treatment under the gas atmosphere including the vapor in the pressure of 0.2 to 4 MPa at the temperature of 200 to 450°C. With the high-pressure vapor terminating step, non-bonding hands of silicon is terminated with hydrogen or hydroxyl group. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2006114576(A) 申请公布日期 2006.04.27
申请号 JP20040298341 申请日期 2004.10.13
申请人 ISHIKAWAJIMA HARIMA HEAVY IND CO LTD 发明人 YAMAMOTO NAOYA;YOSHINOUCHI ATSUSHI
分类号 H01L31/04;H01L21/322 主分类号 H01L31/04
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