| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an exhaust gas scrubber apparatus for an epitaxial wafer manufacturing apparatus safely and efficiently removing deposit generated in a contact process of exhaust gas with washing water. <P>SOLUTION: A washing tube unit 23 formed in a scrubber inlet tube is composed of three layers of an outer tube 24 for normally running inert gas, an intermediate tube 25 formed inside the outer tube 24 and intermittently running inert gas, and an inner tube 26 formed inside the intermediate tube 25 and running washing water and inert gas alternately. A flow-out control plug 27 is attached to the distal end of the inner tube 26 for controlling a spraying angle of washing water flowing out of the inner tube 26, and controlling a jetting direction of inert gas flowing out of the outer tube 24 or intermediate tube 25. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
