发明名称 METHOD AND SYSTEM FOR SCATTER CORRECTION DURING BI-PLANE IMAGING WITH SIMULTANEOUS EXPOSURE
摘要 PROBLEM TO BE SOLVED: To provide a method and a system for scatter correction during bi-plane imaging with simultaneous exposure using a digital image processing. SOLUTION: The basic concept includes correcting the image from each plane by combining it with an image of the scatter generated from the exposures of the opposite plane in such a way that the scatter effects are removed. The correction image is formed by sampling images from the detector (60) with only the X-ray exposure of the scatter producing plane being active. These sampled images of scatter are processed to form the scatter correction image. The scatter correction image is stored in an image memory (39) so that it is available for combination with subsequent X-ray images to remove scatter distortion. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006110359(A) 申请公布日期 2006.04.27
申请号 JP20050299794 申请日期 2005.10.14
申请人 GE MEDICAL SYSTEMS GLOBAL TECHNOLOGY CO LLC 发明人 LAMBERTY JOHN ROBERT;MORROW JAMES G
分类号 A61B6/00;A61B6/03 主分类号 A61B6/00
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